Photolithographic technique and illuminator using real-time addressable phase shift light shift
作者： Tsen-Hwang Lin , Jay M. Brown , Shane R. Palmer , Steven C. Gustafson
DOI:
关键词: Beam splitter 、 Optoelectronics 、 Electro-optic modulator 、 Lithography 、 Laser beam quality 、 Photolithography 、 Beam (structure) 、 Light beam 、 Materials science 、 Optical modulator 、 Optics
摘要: A phase shift illuminator (700) is comprised of a light source (704) and modulator (716), typically flexure beam micromirror array, which transversely modulates the incident beam. When array used as (716) polarizing splitter (712) quarter-wave plate (714) are to separate reflected beams. The modulated (720) from optical may be in lithography by passing through mask (724), after modulated, focusing onto target wafer (726).
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