Laser annealing apparatus and a method for manufacturing a display apparatus using the laser annealing apparatus
作者： Oleg Prudnikov , Byoungkwon Choo , Sanghoon Ahn , Byoungho Cheong , Hyunjin Cho
DOI:
关键词: Polarization (waves) 、 Amorphous silicon 、 Optics 、 Substrate (electronics) 、 Laser beam quality 、 Laser annealing 、 Beam parameter product 、 Materials science 、 Layer (electronics) 、 Beam (structure)
摘要: A method of manufacturing a display apparatus includes forming an amorphous silicon layer on substrate, splitting first laser beam emitted from source into master in polarization state and second state, changing the to output third having corresponding combining with merged beam, irradiating form polysilicon layer.
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