Fabrication of adherent porous diamond films on sintered WC-13 wt.%Co substrates by bias enhanced hot filament chemical vapour deposition

作者: Q. Wei , M. N. R. Ashfold , Z. M. Yu , L. Ma

DOI: 10.1002/PSSA.201100007

关键词: FabricationMetallurgyAdhesionDiamondScanning electron microscopeChemical engineeringPorosityDiffractionChemical vapor depositionMaterials scienceCarbon filmElectrical and Electronic EngineeringMaterials ChemistryElectronic, Optical and Magnetic MaterialsSurfaces, Coatings and FilmsSurfaces and InterfacesCondensed matter physics

摘要: Porous diamond (PD) films have been grown on sintered WC13wt.%Co substrates by bias enhanced hot filament (HF) chemical vapour deposition (CVD) methods and characterized scanning electron microscopy (SEM), laser Raman spectroscopy X-ray diffraction (XRD). The PD show excellent adhesion under Rockwell indentation testing. Factors encouraging the growth of film with high porosity are discussed.

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