Electron channelling analysis of aluminium and xenon-implanted aluminium

作者: C.J. Rossouw , D.I. Potter , S.R. Glanvill

DOI: 10.1016/0304-3991(88)90381-6

关键词: Lattice constantZone axisElectron diffractionChemistryXenonAtomic physicsDiffractionAluminiumChannellingElectronic band structure

摘要: Abstract Characteristic X-ray emission from unimplanted aluminium is measured under near zone axis diffraction conditions. rates change by factors of 2–3 as the crystal tilted with respect to a 120 keV incident electron beam. The probability density ϕϕ ∗ fast wavefunction on atomic sites calculated and correlated observed Kikuchi band structure characteristic count rate. A plot rate versus yields an approximately linear relationship, permitting measurement “incoherent background” contribution ALCHEMI analysis used probe interface between small nm diameter solid xenon particles matrix, where fcc lattice parameter 1.5 times that aluminium. Although relatively strong channelling effect for implanted precipitates insensitive This suggests aluminium/xenon incoherent, conclusion supported previous imaging experiments their comparison images.

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