Method of forming an interlayer insulating film having a siloxane skeleton
作者： Nobuo Aoi
DOI:
关键词: Siloxane 、 Phenyl group 、 Ethyl group 、 Materials science 、 Methyl group 、 Silicon 、 Polymer chemistry
摘要: In a method of forming an interlayer insulating film by plasma CVD, organic siloxane compound including one or more silicon atoms each having at least three units represented general formula, —O—Si(R 1 R 2 )—OR 3 (wherein and are the same as different from other methyl group, ethyl group propyl is phenyl group) used raw material.
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