Single layer microbolometer detector pixel using ZnO material

作者: M. Yusuf Tanrikulu , Ali K. Okyay , Cigdem Yildizak , Tayfun Akin , Orhan Akar

DOI: 10.1117/12.2302996

关键词: FabricationOptoelectronicsYield (engineering)Materials scienceTime constantTemperature coefficientMicrobolometerDetectorAtomic layer depositionThermal conductivity

摘要: This paper presents the development of a single layer microbolometer pixel fabricated using only ZnO material coated with atomic deposition. Due to stress-free nature and high temperature coefficient resistance ALD material, it can be used both as structural active layers in detectors. The design, simulations, fabrication optimization 35 μm microbolometers are shown this study. designed has thermal conductance 3.4x10-7 W/K time constant 1.34 ms while maximum displacement 0.43 under 1000g acceleration. structure decrease design complexities costs increase yield detectors making them possible low-cost applications.

参考文章(4)
Yunus Emre Kesim, Enes Battal, M. Yusuf Tanrikulu, Ali K. Okyay, An all-ZnO microbolometer for infrared imaging Infrared Physics & Technology. ,vol. 67, pp. 245- 249 ,(2014) , 10.1016/J.INFRARED.2014.07.023
A. Jahanzeb, C.M. Travers, Z. Celik-Butler, D.P. Butler, S.G. Tan, A semiconductor YBaCuO microbolometer for room temperature IR imaging IEEE Transactions on Electron Devices. ,vol. 44, pp. 1795- 1801 ,(1997) , 10.1109/16.628839
A Rogalski, P Martyniuk, M Kopytko, Challenges of small-pixel infrared detectors: a review Reports on Progress in Physics. ,vol. 79, pp. 046501- 046501 ,(2016) , 10.1088/0034-4885/79/4/046501
Muhammet Poyraz, Kazim Gorgulu, Zulkarneyn Sisman, Mahmud Yusuf Tanrikulu, Ali Kemal Okyay, LWIR all-atomic layer deposition ZnO bilayer microbolometer for thermal imaging Optical Engineering. ,vol. 56, pp. 037106- 037106 ,(2017) , 10.1117/1.OE.56.3.037106