作者: Katsuyuki Naito , Masatoshi Sakurai
DOI:
关键词: Optoelectronics 、 Substrate (printing) 、 Electrical engineering 、 Layer (electronics) 、 Buffer (optical fiber) 、 Materials science 、 Nano-
摘要: A nano-imprinting method includes a process of transferring an embossed pattern from master plate (120) to surface pattern-receiving or donee substrate (130) by applying pressure the having information carrier region (120A) formed and (139) opposite sides pair press surfaces (100) sandwiching them. When is applied, buffer layer (110) shaped in accordance with interposed position aligned pattern-forming between surface.