Formation of Ti/O compositional gradient film on Ti–6Al–4V alloy by reactive DC sputtering
作者： T Sonoda , M Kato
DOI: 10.1016/S0039-6028(98)00032-6
关键词: Metallurgy 、 Sputter deposition 、 Coating 、 Microstructure 、 Alloy 、 Thin film 、 Titanium 、 Sputtering 、 Composite material 、 Layer (electronics) 、 Materials science
摘要: Coating of Ti-6Al-4V alloy substrates with Ti/O compositional gradient films was carried out by reactive DC sputtering, not only to improve the biocompatibility and surface hardness but also relax stress concentrated at interface between film alloy. The realized varying continuously oxygen content in Ar-O 2 sputter gas during depositing. Under AES, it confirmed that a had formed on alloy, concluded atoms which substrate diffused into titanium layer film. Based results XRD, found α-titanium phase (002) orientation dominant growth. Furthermore, based indentation-fracture tests, this depositing method improved adhesion deposited toughness
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