Modeling of mask diffraction and projection imaging for advanced optical and EUV lithography
作者： Andreas Erdmann , Feng Shao , Viviana Agudelo , Tim Fühner , Peter Evanschitzky
DOI: 10.1080/09500340.2010.515752
关键词: Extreme ultraviolet lithography 、 Electromagnetic field 、 Optoelectronics 、 Predictive simulation 、 Extreme ultraviolet 、 Diffraction 、 Optics 、 Polarization (waves) 、 Materials science 、 Lithography
摘要: … Rigorous electromagnetic field (EMF) modeling of the mask is indispensable for a predictive … of the mask diffraction is indispensable to predict realistic mask geometries and their impact …
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