作者: Younan Xia , John A. Rogers , Kateri E. Paul , George M. Whitesides
DOI: 10.1021/CR980002Q
关键词: Embossing 、 Nanostructure 、 Soft lithography 、 Nanotechnology 、 Chemistry 、 Lithography 、 Metastable atoms 、 Photolithography 、 Etching (microfabrication) 、 Size reduction
摘要: 4.1. Nanomachining with Scanning Probes 1831 4.2. Soft Lithography 1832 4.3. Embossing Rigid Masters 1835 4.4. Near-Field Phase-Shifting Photolithography 4.5. Topographically Directed 1837 4.6. Etching 4.7. Neutral Metastable Atoms 1838 4.8. Approaches to Size Reduction 1839 5. Techniques for Making Regular or Simple Patterns