作者: Jeffrey W. Elam , Anil U. Mane
DOI:
关键词: Layer (electronics) 、 Boron 、 Materials science 、 Composite number 、 Chemical formula 、 Analytical chemistry 、 Range (particle radiation) 、 Monolayer 、 Substrate surface
摘要: A method for forming boron (B) containing Al 2 O 3 composite layers includes (a) reacting a substrate surface with an aluminum-containing precursor to form first monolayer, (b) purging excess and reaction by-product, (c) the monolayer second precursor, (d) such that steps constitute one cycle, being formed after plurality of cycles, resultant have chemical formula B x 2−x , where varies in range 0 2.