Method of manufacturing imaging apparatus
作者： Tadashi Sawayama , Yusuke Tsukagoshi , Sho Suzuki , 政次 板橋 , Masaji Itabashi
DOI:
关键词: Materials science 、 Pixel 、 Optoelectronics 、 Waveguide 、 Substrate (electronics) 、 Etching (microfabrication) 、 Layer (electronics)
摘要: Provided is a method of manufacturing an imaging apparatus. The apparatus formed on substrate and includes pixel region peripheral circuit that arranged periphery the region. includes: forming insulating layer in region; etching state which protected; planarizing surface layer; waveguide After before layer, average value heights top larger than
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