Solid-state image sensor, method for manufacturing the same, and camera

作者: Yusuke Onuki , Kentarou Suzuki

DOI:

关键词:

摘要: A method for manufacturing a solid-state image sensor having pixel region, peripheral circuit and an intermediate region interposed between the includes forming high melting point metal compound in active regions of etch stop film on formed interlayer insulating film, forming, by using contact plug to region.

参考文章(14)
Kuan-Chieh Huang, Dun-Nian Yaung, Chih-Jen Wu, An-Chun Tu, Chen-Ming Huang, Method for reducing contact resistance of CMOS image sensor ,(2012)
Jen-Cheng Liu, Han-Chi Liu, Yuan-Hung Liu, Yin-Kai Liao, Dun-Nian Yaung, Image Sensor Having Enhanced Backside Illumination Quantum Efficiency ,(2009)
Yasushi Tateshita, Keiji Tatani, Takuji Matsumoto, Kazuichiro Itonaga, Solid-state imaging device, method for manufacturing solid-state imaging device, and imaging apparatus ,(2015)
Hirosumi Kabushiki Kaisha Toshiba Yamashita, Hidetoshi Kabushiki Kaisha Toshiba Nozaki, Ikuko Kabushiki Kaisha Toshiba Inoue, Solid state imaging device having a photodiode and a MOSFET and method of manufacturing the same ,(2001)
Jianping Yang, Jieguang Huo, Chunyan Xin, Method of making CMOS image sensor—hybrid silicide ,(2005)