作者: D. K. Mohata , R. Bijesh , S. Mujumdar , C. Eaton , R. Engel-Herbert
DOI: 10.1109/IEDM.2011.6131665
关键词: Arsenide 、 Silicon 、 Compound semiconductor 、 Antimonide 、 MOSFET 、 Materials science 、 Optoelectronics 、 Gallium arsenide 、 Logic gate
摘要: Type II arsenide/antimonide compound semiconductor with highly staggered GaAs 0.35 Sb 0.65 /In 0.7 Ga 0.3 As hetero-junction is used to demonstrate hetero tunnel FET (TFET) record high drive currents (I ON ) of 190µA/µm and 100µA/µm at V DS =0.75V 0.3V, respectively (L G =150nm). In x 1−x (x=0.53, 0.7) homo-junction TFETs 0.5 0.53 0.47 TFET moderate stagger are also fabricated the same process flow for benchmarking. Measured simulated performance benchmarked 40nm strained Si MOS-FETs 300mV logic applications.