Surface plasmon resonance in near-field coupled gold cylinder arrays fabricated by EUV-interference lithography and hot embossing
作者： P.K. Sahoo , K. Vogelsang , H. Schift , H.H. Solak
DOI: 10.1016/J.APSUSC.2009.06.079
关键词: Materials science 、 Extreme ultraviolet lithography 、 Surface plasmon 、 Surface plasmon resonance 、 Lithography 、 Optics 、 Surface-enhanced Raman spectroscopy 、 Plasmon 、 Interference lithography 、 Nanoparticle
摘要: Arrays of metal nanoparticles with nanometer-scale gaps between the particles is highly interesting for plasmonic field enhancement applications. We report a simple method to fabricate arrays closely spaced Au inter-particle separation down 20 nm. used extreme ultraviolet interference lithography (EUV-IL) and mechanical press two-dimensional nanoparticles. Lithographically produced particle were modified by hot pressing in nanoimprint machine gap was varied range from 50 nm below Optical measurement shows two resonances at 520 620 nm, latter gaining strength as reduced. The experimental theoretical investigations using FDTD algorithm demonstrate that low-energy resonance can be assigned collective surface plasmon arising strong near-field coupling Surface Enhanced Raman Spectroscopy (SERS) experiments performed on model molecule (BPE) show large gain signal intensity result reduced particles.
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