Multiple-beam interference lithography with electron beam written gratings

摘要: Interference lithography with multiple beams provides two-dimensional periodic patterns in a single exposure step. It is possible to obtain various symmetries and shapes such as sparse hole arrays or dots on hexagonal grid. However, when the number of interfering exceeds three, intensity pattern depends strongly relative phases beams. In this article we show that problem can be overcome scheme where transmission diffraction gratings written substrate create possessing required phase relations. The diffracted are controlled by positions plane. We used electron beam an interferometrically stage precise placement gratings. This method enabled us produce square holes three four configurations, respectively. Moreover, created have six eight interference. experiments were carried out extreme ultraviolet region synchrotron radiation laser light visible spectrum. technique requires spatially coherent but it achromatic not sensitive small errors alignment incoming beam.