Introduction: LIGA and Its Applications

作者: Volker Saile

DOI: 10.1002/9783527622573.CH1

关键词: NanotechnologyLIGAMaterials science

摘要:

参考文章(10)
M. Guttmann, J. Schulz, V. Saile, Lithographic Fabrication of Mold Inserts Microengineering of Metals and Ceramics. pp. 187- 219 ,(2005) , 10.1002/9783527616725.CH8
Ulrike Wallrabe, Volker Salle, LIGA Technology for R&D and Industrial Applications MEMS#R##N#A Practical Guide to Design, Analysis, and Applications. pp. 853- 899 ,(2006) , 10.1007/978-3-540-33655-6_16
H. H. Solak, C. David, J. Gobrecht, L. Wang, F. Cerrina, Multiple-beam interference lithography with electron beam written gratings Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. ,vol. 20, pp. 2844- 2848 ,(2002) , 10.1116/1.1518015
Peter S. Hauge, Preface: cumulative index Ibm Journal of Research and Development. ,vol. 37, pp. 678- 678 ,(1993) , 10.1147/RD.376.0678
E. W. Backer, W. Ehrfeld, D. Münchmeyer, H. Betz, A. Heuberger, S. Pongratz, W. Glashauser, H. J. Michel, R. v. Siemens, Production of separation-nozzle systems for uranium enrichment by a combination of X-ray lithography and galvanoplastics Naturwissenschaften. ,vol. 69, pp. 520- 523 ,(1982) , 10.1007/BF00463495
E. Spiller, D. E. Eastman, R. Feder, W. D. Grobman, W. Gudat, J. Topalian, Application of synchrotron radiation to x‐ray lithography Journal of Applied Physics. ,vol. 47, pp. 5450- 5459 ,(1976) , 10.1063/1.322577
Harun H Solak, Nanolithography with coherent extreme ultraviolet light Journal of Physics D. ,vol. 39, ,(2006) , 10.1088/0022-3727/39/10/R01
Pascal Meyer, Volker Saile, Joachim Schulz, Olaf Klein, Markus Arendt, Launching into a golden age: gears (mm parts) made by the deep X-ray LIG(A) process International Journal of Technology Transfer and Commercialisation. ,vol. 7, pp. 362- 370 ,(2008) , 10.1504/IJTTC.2008.021034
A. Heuberger, X-ray lithography Microelectronic Engineering. ,vol. 3, pp. 535- 556 ,(1985) , 10.1016/0167-9317(85)90067-X