Patterning a 50-nm period grating using soft x-ray spatial frequency multiplication

作者: Max Wei , David T Attwood , TK Gustafson , Erik H Anderson

DOI: 10.1116/1.587632

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摘要: Soft x‐ray spatial frequency multiplication is a technique that has the capability of reducing by factor 2 or more finest period grating can be written other methods. We describe two geometries for this technique: single‐grating geometry requires spatially coherent illumination, and two‐grating used with incoherent illumination. Starting parent p area A, gratings p/2, p/4, p/6 over an A/3, A/5, A/7, respectively, printed in geometry. The produces same final periods p, but limited only sizes gratings. As initial demonstration technique, we have to pattern 50‐nm polymethylmethacrylate 30 μm×100 μm, starting 100‐nm 90 μm. source was synchrotron undulator at λ=18 A required 5‐min exposure time. Recent developments radiation from sources will give shorter times permit larger areas patterned

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