Four-wave EUV interference lithography
作者： H.H. Solak , C. David , J. Gobrecht , L. Wang , F. Cerrina
DOI: 10.1016/S0167-9317(02)00579-8
关键词:
摘要: … beam Extreme Ultraviolet (EUV) interference lithography system to create two-dimensional periodic structures. A spatially coherent EUV beam from … written by electron beam lithography. …
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sci-hub.se 参考文章(11)
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