Throughput comparison of multi-exposure and multi-beam laser interference lithography on nano patterned sapphire substrate process

作者: C. Fu , T. Lin , T. Huang , Y. Yang , K. Tseng

DOI: 10.1109/NEMS.2014.6908873

关键词:

摘要:

参考文章(9)
Johannes de Boor, Dong Sik Kim, Volker Schmidt, Sub-50 nm patterning by immersion interference lithography using a Littrow prism as a Lloyd’s interferometer Optics Letters. ,vol. 35, pp. 3450- 3452 ,(2010) , 10.1364/OL.35.003450
Maya Farhoud, Juan Ferrera, Anthony J. Lochtefeld, T. E. Murphy, Mark L. Schattenburg, J. Carter, C. A. Ross, Henry I. Smith, Fabrication of 200 nm period nanomagnet arrays using interference lithography and a negative resist Journal of Vacuum Science & Technology B. ,vol. 17, pp. 3182- 3185 ,(1999) , 10.1116/1.590976
I. Bita, T. Choi, M. E. Walsh, H. I. Smith, E. L. Thomas, Large‐Area 3D Nanostructures with Octagonal Quasicrystalline Symmetry via Phase‐Mask Lithography Advanced Materials. ,vol. 19, pp. 1403- 1407 ,(2007) , 10.1002/ADMA.200700178
H.H. Solak, C. David, J. Gobrecht, L. Wang, F. Cerrina, Four-wave EUV interference lithography Microelectronic Engineering. pp. 77- 82 ,(2002) , 10.1016/S0167-9317(02)00579-8
Q. Xie, M.H. Hong, H.L. Tan, G.X. Chen, L.P. Shi, T.C. Chong, Fabrication of nanostructures with laser interference lithography Journal of Alloys and Compounds. ,vol. 449, pp. 261- 264 ,(2008) , 10.1016/J.JALLCOM.2006.02.115
Ikjoo Byun, Joonwon Kim, Cost-effective laser interference lithography using a 405 nm AlInGaN semiconductor laser Journal of Micromechanics and Microengineering. ,vol. 20, pp. 055024- ,(2010) , 10.1088/0960-1317/20/5/055024
Johannes de Boor, Nadine Geyer, Ulrich Gösele, Volker Schmidt, Three-beam interference lithography: upgrading a Lloyd's interferometer for single-exposure hexagonal patterning. Optics Letters. ,vol. 34, pp. 1783- 1785 ,(2009) , 10.1364/OL.34.001783
D. S. Wuu, W. K. Wang, K. S. Wen, S. C. Huang, S. H. Lin, R. H. Horng, Y. S. Yu, M. H. Pan, Fabrication of Pyramidal Patterned Sapphire Substrates for High-Efficiency InGaN-Based Light Emitting Diodes Journal of The Electrochemical Society. ,vol. 153, ,(2006) , 10.1149/1.2209587
Ivan B. Divliansky, Atsushi Shishido, Iam-Choon Khoo, Theresa S. Mayer, David Pena, Suzushi Nishimura, Christine D. Keating, Thomas E. Mallouk, Fabrication of two-dimensional photonic crystals using interference lithography and electrodeposition of CdSe Applied Physics Letters. ,vol. 79, pp. 3392- 3394 ,(2001) , 10.1063/1.1420584