Three-beam interference lithography: upgrading a Lloyd's interferometer for single-exposure hexagonal patterning.
作者： Johannes de Boor , Nadine Geyer , Ulrich Gösele , Volker Schmidt
DOI: 10.1364/OL.34.001783
关键词: Lithography 、 Lloyd's mirror 、 Optics 、 Interference (wave propagation) 、 Astronomical interferometer 、 Photoresist 、 Interferometry 、 Spatial filter 、 Physics 、 Interference lithography
摘要: Three-beam interference lithography is used to create hole/dot photoresist patterns with hexagonal symmetry. This achieved by modifying a standard two-beam Lloyd's mirror interferometer into three-beam interferometer, the position of mirrors chosen guarantee 120° symmetry exposure. Compared commonly setups, this brings advantage simplified alignment, as respect substrate fixed. Pattern periodicities from several wavelengths λ down 2/3λ are thus easily and continuously accessible simply rotating interferometer. Furthermore, in contrast interferometers, only single exposure needed patterns.
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