Space-invariant multiple-beam achromatic EUV interference lithography

摘要: We report the production of two-dimensional periodic patterns with defined cell shapes, such as arrays circular rings, multiple-beam extreme ultraviolet (EUV) interference lithography. The method combines coherent and incoherent addition fields in a single exposure step to produce high-resolution, space-invariant intensity patterns. use wideband light, instead highly monochromatic sources like lasers, eliminates variation pattern multiple beams interfere. technique is especially useful EUV region undulator that wavelength range provide radiation relatively wide bandwidth. In demonstration experiments nanometer scale rings dots PMMA resist were obtained. has potential for applications where periodically repeated structures are needed display units, optical filters, electronic memory logic circuits magnetic storage devices.