Interference pattern formation from an array of coherent laser beams
作者： Y. Liu , J. Barhen , Y. Braiman , J. X. Zhong
DOI: 10.1116/1.1523396
关键词: Feature (computer vision) 、 Photolithography 、 Interferometry 、 Beam (structure) 、 Near and far field 、 Optics 、 Numerical analysis 、 Interference (wave propagation) 、 Gaussian 、 Physics
摘要: We present numerical analysis of interferometric patterns formed by multiple sources. Multiple beams can be achieved either from a synchronized laser array or splitting coherent light source. assume Gaussian form for each beam, and all the are combined at near field. The condition achieving periodic structures with feature size significantly smaller than λ/4 is obtained. beam interference has potential size, less power requirement, more flexibility conventional two-beam lithography method.
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