Deposition techniques for chalcogenide thin films
作者： J. Orava , T. Kohoutek , T. Wagner
DOI: 10.1533/9780857093561.1.265
关键词: Carbon film 、 Deposition (phase transition) 、 Atomic layer deposition 、 Chalcogenide 、 Thin film 、 Nanotechnology 、 Combustion chemical vapor deposition 、 Materials science 、 Physical vapor deposition 、 Pulsed laser deposition
摘要: Abstract: The chapter describes details of deposition techniques, namely thermal evaporation, sputtering, pulsed-laser deposition, chemical vapour and spin-coating for chalcogenide thin films. We discuss key issues, advantages influence different techniques experimental conditions on properties as-prepared amorphous final composition, structure physico-chemical the prepared films predetermine their application vice versa. Their applications are in many fields such as (nano)electronics, (nano)optics, information storage, security, health protection alternative energy sources.
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