作者: B.S. Ooi , C.J. Hamilton , K. McIlvaney , A.C. Bryce , R.M. De La Rue
DOI: 10.1109/68.588128
关键词: Band gap 、 Gallium arsenide 、 Slope efficiency 、 Ion implantation 、 Irradiation 、 Materials science 、 Optoelectronics 、 Laser 、 Dielectric 、 Quantum well
摘要: We report the use of a pulsed laser irradiation technique, using multiphoton absorption, to promote quantum-well intermixing (QWI) in double-quantum-well GaAs-AlGaAs structures. The process requires neither ion implantation nor deposition dielectric caps. Differential bandgap shifts up 40 meV have been obtained between control and irradiated samples. Bandgap tuned lasers were fabricated from intermixed samples exhibited negligible changes slope efficiency only small increases (15%) threshold current compared as-grown devices.