作者: A S W Lee , D A Thompson , B J Robinson
DOI: 10.1088/0268-1242/15/12/101
关键词: Blueshift 、 Mineralogy 、 Chemistry 、 Dielectric 、 Band gap 、 Epitaxy 、 Quantum well 、 Molecular beam epitaxy 、 Photoluminescence 、 Optoelectronics 、 Semiconductor laser theory
摘要: Quantum well intermixing (QWI) in an InGaAsP multiple-quantum-well (MQW) laser structure is demonstrated using InP epitaxial layer grown at 300 °C, by gas source molecular beam epitaxy, followed rapid thermal annealing. Photoluminescence used to compare the magnitude of QWI process between low-temperature (LT)- and normal-temperature (NT, 470 °C)-grown layers as a function both anneal temperature time. For example, after 780 °C, large bandgap blue-shift ~197 nm observed MQW structures capped with LT-InP compared ~35 nm shift identical NT-InP. Also, effect capping NT-InP, dielectric (~100 nm SiO2), following 800 °C for 60 s. This shows blue-shifts ~243 ~142 nm, respectively.