Enhanced bandgap blue-shift in InGaAsP multiple-quantum-well laser structures by low-temperature-grown InP

作者: A S W Lee , D A Thompson , B J Robinson

DOI: 10.1088/0268-1242/15/12/101

关键词: BlueshiftMineralogyChemistryDielectricBand gapEpitaxyQuantum wellMolecular beam epitaxyPhotoluminescenceOptoelectronicsSemiconductor laser theory

摘要: Quantum well intermixing (QWI) in an InGaAsP multiple-quantum-well (MQW) laser structure is demonstrated using InP epitaxial layer grown at 300 °C, by gas source molecular beam epitaxy, followed rapid thermal annealing. Photoluminescence used to compare the magnitude of QWI process between low-temperature (LT)- and normal-temperature (NT, 470 °C)-grown layers as a function both anneal temperature time. For example, after 780 °C, large bandgap blue-shift ~197 nm observed MQW structures capped with LT-InP compared ~35 nm shift identical NT-InP. Also, effect capping NT-InP, dielectric (~100 nm SiO2), following 800 °C for 60 s. This shows blue-shifts ~243 ~142 nm, respectively.

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