Growth of carbon nanotubes characterized by field emission measurements during chemical vapor deposition
作者： Jean-Marc Bonard , Mirko Croci , Christian Klinke , Fabien Conus , Imad Arfaoui
DOI: 10.1103/PHYSREVB.67.085412
关键词: Chemical vapor deposition 、 Nanotechnology 、 Cathode 、 Field electron emission 、 Common emitter 、 Analytical chemistry 、 Growth rate 、 Nanostructure 、 Carbon nanotube 、 Materials science 、 Phosphor
摘要: The growth of multiwall carbon nanotubes is characterized in situ a chemical vapor deposition reactor by measuring the current extracted field emission from growing nanostructures. lengthening provokes an increase emitted at constant applied voltage, and use phosphor screen allows to observe individual emitters during growth. A simple model permits furthermore estimate rate. grow with closed cap under 10 - 2 -10 4 mbar C H2 700 °C rate over I μm/s that increases H pressure. neither simultaneous nor homogeneous cathode involves different activation time for every emitter.
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