作者: Edward S. Kolesar , Victor M. Bright , David M. Sowders
DOI: 10.1016/0040-6090(95)06858-9
关键词: Integrating sphere 、 Optics 、 Wafer 、 Visible spectrum 、 Porous silicon 、 Anti-reflective coating 、 Silicon 、 Absorption (electromagnetic radiation) 、 Thin film 、 Materials science
摘要: Abstract High-performance solar cells and optical detection devices frequently incorporate microscopic surface texturing antireflective (AR) thin films to reduce the reflection of incident radiation and, thus, enhance absorption. Using conventional electrochemical single-crystal silicon micromachining techniques, porous (PS) textured surfaces composed randomly spaced sized pyramids (RSSPs) were fabricated optically characterized over mid-infrared (2.5 ≤ λ 12.5 μm) portion spectrum. The utility a 1.53 ± 0.03 μm thick yttrium oxide (Y2O3) AR film was also investigated in an attempt measurements accomplished using 21 ° illumination angle (measured with respect sample's normal) Bomem® total integrating sphere quantify (specular diffuse) reflectance (R). A highly-polished, uncoated, wafer used as reference (Rave = 0.436 Rσ 0.033). performance uncoated PS samples revealed Rave 0.205 0.078, RSSP manifested 0.090 0.003. coating significantly improved surfaces: sample, 0.251 0.040; samples, 0.024 0.017). did not improve samples; however, R characteristics for 0.5 2.5 spectrum reduced by more than 50%.