作者: Kazunori Anazawa , Yoshihiko Hirotsu , Yukio Ichinose
DOI: 10.1016/0022-3093(93)90162-Q
关键词: Annealing (metallurgy) 、 Lattice constant 、 Amorphous metal 、 Macle 、 Amorphous solid 、 Sputtering 、 Electron microscope 、 Thin film 、 Analytical chemistry 、 Crystallography 、 Chemistry 、 Materials Chemistry 、 Electronic, Optical and Magnetic Materials 、 Condensed matter physics 、 Ceramics and Composites
摘要: Abstract Amorphous Pd82Si18 thin films were prepared by the argon-beam sputtering technique. The specimens deposited on NaCl substrates with a substrate temperature of 293 K. An investigation medium-range order (MRO) and its relation to structural relaxation decomposition annealing has been made means high-resolution electron microscopy, nano-beam diffraction elemental analysis. Domains fcc MRO observed in as-sputtered film. At initial stage annealing, number domains increases they grow increasing temperature. This corresponds that relaxation. large grown become nano-precipitates which may be called ‘nuclei α-Pd precipitates’. lattice parameter becomes closer pure size precipitates. Si composition (nano-)precipitates starts decrease when is increased 523