Electron Diffraction Intensity Analysis of Amorphous Pd 75 Si 25 Alloy Thin Film with Imaging-Plate Technique
作者： Mitsuhide Matsushita , Yoshihiko Hirotsu , Kazunori Anazawa , Tadakatsu Ohkubo , Tetsuo Oikawa
DOI: 10.2320/MATERTRANS1989.36.822
关键词:
摘要: Atomic pair distribution function (PDF) analysis for an amorphous Pd 75 Si 25 alloy thin film has been made by means of electron diffraction intensity measurement with the help imaging-plate (IP). This is aimed developing a structural technique using diffraction, which complementary to high resolution microscopy (HREM) in studying structures. In measurement, correction omit inelastic part performed taking advantage energy loss spectroscopy. PDF subpeak Pd-Si correlation at distance 0.24 nm was clearly observed near first mainpeak Pd-Pd correlation. Availability IP precise therefore, proved. accordance strong and coordination number close that 3 Si, Si-like medium range order structure HREM. A model based on HREM result constructed examined.
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