DEFECT ANALYSIS SUPPORT DEVICE, PROGRAM EXECUTED BY DEFECT ANALYSIS SUPPORT DEVICE, AND DEFECT ANALYSIS SYSTEM

作者: Obara Kenji , Hirai Tomohiro , Nakagaki Akira

DOI:

关键词: Hierarchy (mathematics)Layer (object-oriented design)Computer hardwareImage (mathematics)Degree (graph theory)CoincidenceComputer scienceDivision (mathematics)

摘要: PROBLEM TO BE SOLVED: To provide a defective image analysis device capable of specifying pattern or layer on which defect occurs by overlapping to be analyzed design layout data, and system improving efficiency work selecting from the data.SOLUTION: A support divides an target for each hierarchy corresponding manufacturing steps create plurality division images (602), determines degree coincidence respective with layers data (604), specifies having highest one among as (605).

参考文章(3)
Yutaka Tandai, Yuji Takagi, Tsunehiro Sakai, Tamao Ishikawa, Kazunori Nemoto, Takehiro Hirai, Kazuhisa Hasumi, Katsuhiko Ichinose, Koichi Hayakawa, Semiconductor defect classifying method, semiconductor defect classifying apparatus, and semiconductor defect classifying program ,(2010)