Charged-particle microscope device and method for inspecting sample using same
作者： Kenji Nakahira , Atsushi Miyamoto
DOI:
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摘要: A high-performance image quality improvement process, capable of improving the low-definition areas (lower layer patterns in a multilayer, bottoms holes hole pattern, etc.), is performed to captured image. Definition enhancement intensity calculated using height information included design data or estimate values sample from image, and process definition intensity.
lens.org 参考文章(13)
Shigeru Kakumoto, Yuji Toda, Toshiyuki Yoshimura, Shinji Okazaki, High density storage of information on a substrate with multiple depth and height ,(1991)
Ryo Nakagaki, Yuya Toyoshima, Kenji Watanabe, Chle Shishido, Maki Tanaka, Method for measuring three dimensional shape of a fine pattern ,(2003)
Steven Holmes, Colin Brodsky, Scott Bukofsky, Automated sub-field blading for leveling optimization in lithography exposure tool ,(2005)
Toshifumi Honda, Kenji Nakahira, Atsushi Miyamoto, Scanning electron microscope and method for processing an image obtained by the scanning electron microscope ,(2008)
Tamihide Yasumoto, Naohiro Takahashi, Semiconductor wafer defect inspection method and apparatus ,(2006)
Wataru Nagatomo, Hidetoshi Morokuma, Ryoichi Matsuoka, Takumichi Sutani, Atsushi Miyamoto, Method and apparatus for measuring dimension of a pattern formed on a semiconductor wafer ,(2006)
Toshifumi Honda, Atsushi Miyamoto, 宮本敦, 本田敏文, Kenji Nakahira, 中平健治, Scanning charged particle microscope device, and processing method of image acquired with scanning charged particle microscope device ,(2007)
Kenji Nakahira, 健治 中平, Atsushi Miyamoto, 敦 宮本, Charged particle microscope and image processing method using it ,(2008)
Ryoichi Matsuoka, 康隆 豊田, Akiyuki Sugiyama, Yasutaka Toyoda, Takuji Sutani, 良一 松岡, 明之 杉山, 拓路 酢谷, 英光 納谷, Eiko Naya, Pattern inspection unit and semiconductor inspection system using the same ,(2005)
Takabayashi Hitoshi, MICROSCOPIC METHOD AND DEVICE ,(1991)