Method and apparatus for measuring dimension of a pattern formed on a semiconductor wafer

作者: Wataru Nagatomo , Hidetoshi Morokuma , Ryoichi Matsuoka , Takumichi Sutani , Atsushi Miyamoto

DOI:

关键词: Section (archaeology)Image (mathematics)EngineeringImage file formatsArtificial intelligenceComputer visionCADWaferBrightnessDimension (vector space)Minimum time

摘要: In an imaging recipe creating apparatus that uses a scanning electron microscope to create for SEM observation of semiconductor pattern, in order the measuring wiring width and other various dimension values pattern from image thus evaluating shape is automatically generated within minimum time by analysis using CAD obtained conversion data, creation unit creates converting data into format includes image-quantizing determining section, brightness information providing deformation processing section; being created unit.

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