Feedback method to repair phase shift masks
作者： Timothy E. Neary , Edward W. Conrad , Orest Bula
DOI:
关键词: Aerial image 、 Phase-shift mask 、 Optics 、 Computer graphics (images) 、 Materials science
摘要: A method of repairing a semiconductor phase shift mask comprises first providing having defect and then illuminating the to create an aerial image mask. Subsequently, is analyzed in detected from image. An ideal defined compared defective determine repair parameters. Unique parameters for are determined by utilizing analysis look-up table information on patch properties as function material deposition The repaired accordance with correct defect. attenuated may be applied or predetermined amount removed whether sufficiently corrects within tolerances.
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