Simple repair method for phase shifting masks
作者： Burn Jeng Lin , Lars W. Liebmann , Mark O. Neisser
DOI:
关键词: Photolithography 、 Phase-shift mask 、 Repair method 、 Wafer 、 Phase (waves) 、 Optics 、 Opacity 、 Difficult problem 、 Engineering
摘要: A method and apparatus for correcting defects in a phase shift mask to be used photolithography. More specifically, the of invention includes creating second repair which contains shifters. Regions surrounding on first are made opaque. The design circuitry located these defective regions is copied onto mask. During exposure placed semiconductor wafer. Therefore, this provides an inexpensive solution difficult problem.
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