Split and cover technique for phase shifting photolithography

摘要: A photolithographic technique and apparatus involving two exposures the sectioning of a first original mask opening that has segments which conflict with second opening. plurality segmented openings are configured in including at least one phase shifted non-phase Imaging radiation is projected through onto electromagnetic application regions (EARs) on surface to be imaged during exposure, EAR's being other shifted. At formed mask. Radiation or more EARs another exposure. interconnects EARs. The split mask, cover both masks may single substrate.