Soft UV Nanoimprint Lithography: A Tool to Design Plasmonic Nanobiosensors

摘要: The capability for realizing high density nanostructures over large areas is important the sensing of chemical and biological molecules based on localized surface plasmon resonance (LSPR) metallic nanoparticles (Jensen et al., 1999; Barbillon 2008; Faure 2008). To characterize these plasmonic nanosensors an area of∼ 100× 100 μm2 (Barbillon 2009; Anker 2008), extinction spectroscopy measurements are mainly used. In order to study multiple biomolecular interactions same surface, very need be fabricated. Various techniques such as focused ion beam lithography electron available design surfaces. However, two slow obtain Moreover, charge effect insulating can alter regularity pattern shape. Thus, will not suitable a scale production. Other lithographic extreme UV also used, but (fabrication masks) expensive allow with difficulty realize samples in small quantity. addition, alternative methods emerged, among we find soft nanoimprint (UV-NIL). UV-NIL process fast nanostructures, compatible biochemical applications (Krauss & Chou, 1997). With UV-NIL, fabricated at room temperature low pressure. A limiting factor exists this resolution molds (Jung 2006; Austin 2005). Flexible technique were by cast molding processes, which appropriate liquid mold material deposited patterned master mold, followed optical curing material. great homogeneity patterns obtained zone. purpose chapter present details principle results structure fabrication glass substrates LSPR molecules. finish, biomolecules investigated validate use UV-NIL.