Sputter-emission of negative and neutral mon-atomic oxygen from YBCO targets
作者： Jens-Peter Krumme
DOI: 10.1007/978-4-431-68266-0_196
关键词: Work (thermodynamics) 、 Materials science 、 Flux 、 Yield (chemistry) 、 Hydrogen 、 Atomic physics 、 Oxygen 、 Sputter deposition 、 Ion 、 Sputtering
摘要: In this article the production and energy distribution of negatively charged atomic oxygen O- in dc- rf- magnetron sputtering are discussed based on recent work from other laboratories our own. It is shown that a majority these energetic secondary ions originate target surface their flux kinetic-energy related to target-sheath voltage, primary sputter-ions, such as Ar+, collisional losses Ar+ when traversing sheath. Factors affecting yield ions, composition, or rf-sheath, primary-ion mass, hydrogen admixture sputter-gas briefly touched.
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