Ion bombardment in rf plasmas
作者： J. Liu , G. L. Huppert , H. H. Sawin
DOI: 10.1063/1.346278
关键词: Monte Carlo method 、 Argon 、 Chemistry 、 Plasma etching 、 Plasma 、 Ion 、 Debye sheath 、 Direct current 、 Perpendicular 、 Atomic physics
摘要: … with ion transport through the plasma sheath must be quantitatively understood. Measured ion bombardment energy and angle distributions for an argon plasma are presented in this …
scitation.org
harvard.edu
aip.org
sci-hub.se 参考文章(37)
W. M. Greene, Ion-bombardment-enhanced plasma etching of tungsten with NF3/O2 Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. ,vol. 6, pp. 1570- 1572 ,(1988) , 10.1116/1.584216
W. M. Greene, M. A. Hartney, W. G. Oldham, D.W. Hess, Ion transit through capacitively coupled Ar sheaths: Ion current and energy distribution Journal of Applied Physics. ,vol. 63, pp. 1367- 1371 ,(1988) , 10.1063/1.339965
R. T. C. Tsui, Calculation of Ion Bombarding Energy and Its Distribution in rf Sputtering Physical Review. ,vol. 168, pp. 107- 113 ,(1968) , 10.1103/PHYSREV.168.107
D. A. Doughty, E. A. Den Hartog, J. E. Lawler, Current balance at the surface of a cold cathode Physical Review Letters. ,vol. 58, pp. 2668- 2671 ,(1987) , 10.1103/PHYSREVLETT.58.2668
J. W. Coburn, A System for Determining the Mass and Energy of Particles Incident on a Substrate in a Planar Diode Sputtering System Review of Scientific Instruments. ,vol. 41, pp. 1219- 1223 ,(1970) , 10.1063/1.1684763
Natasha C.Us, R. W. Sadowski, J. W. Coburn, Quartz crystal microbalance simulation of the directionality of Si etching in CF4 glow discharges Plasma Chemistry and Plasma Processing. ,vol. 6, pp. 1- 10 ,(1986) , 10.1007/BF00573817
J. M. E. Harper, J. J. Cuomo, P. A. Leary, G. M. Summa, H. R. Kaufman, F. J. Bresnock, Low Energy Ion Beam Etching Journal of The Electrochemical Society. ,vol. 128, pp. 1077- 1083 ,(1981) , 10.1149/1.2127554
Brian E. Thompson, Herbert H. Sawin, Donald A. Fisher, Monte Carlo simulation of ion transport through rf glow‐discharge sheaths Journal of Applied Physics. ,vol. 63, pp. 2241- 2251 ,(1988) , 10.1063/1.341062
J. W. Coburn, Eric Kay, Positive‐ion bombardment of substrates in rf diode glow discharge sputtering Journal of Applied Physics. ,vol. 43, pp. 4965- 4971 ,(1972) , 10.1063/1.1661054
J.B. Hasted, Ion-Atom Charge Transfer Collisions at Low Energies Advances in atomic and molecular physics. ,vol. 15, pp. 205- 233 ,(1979) , 10.1016/S0065-2199(08)60299-7