Overview of Plasma Diagnostic Techniques

作者: G. A. Hebner , P. A. Miller , J. R. Woodworth

DOI: 10.1007/978-3-642-56989-0_5

关键词:

摘要: Plasma diagnostics is a broad area of technology that encompasses diverse, venerable field experimental techniques designed to provide information about the characteristics plasma. Plasmas used in microelectronics processing fall into category low temperature plasmas. Typical plasma include electron densities between 109 and 1012 cm-3, temperatures from 0.1 10 eV, pressures few Torr millitorr or below excitation frequencies dc microwave. These parameters span relatively wide range conditions make selection best diagnostic tools challenging.

参考文章(117)
David Neil Ruzic, Electric probes for low temperature plasmas American Vacuum Society. ,(1994)
J. A. Bearden, A. F. Burr, Atomic energy levels U. S. Atomic Energy Commission. ,(1965)
K. Sasaki, Y. Kawai, C. Suzuki, K. Kadota, ABSOLUTE DENSITY AND REACTION KINETICS OF FLUORINE ATOMS IN HIGH-DENSITY C-C4F8 PLASMAS Journal of Applied Physics. ,vol. 83, pp. 7482- 7487 ,(1998) , 10.1063/1.367511
C. B. Fleddermann, G. A. Hebner, Measurements of relative BCl density in BCl3-containing inductively coupled radio frequency plasmas Journal of Applied Physics. ,vol. 83, pp. 4030- 4036 ,(1998) , 10.1063/1.367158
J.A.R. Samson, D. L. Ederer, Vacuum Ultraviolet Spectroscopy ,(2000)