作者: C. B. Fleddermann , G. A. Hebner
DOI: 10.1063/1.367158
关键词:
摘要: The relative density of BCl radicals in inductively coupled plasmas has been studied using laser-induced fluorescence (LIF), and the excited state plasma-induced emission (PIE). Measurements were made as a function input power, pressure, position, gas ratio for industry-relevant metal-etch mixtures containing BCl3, Cl2, Ar, N2. LIF was used to measure ground population, whereas PIE monitored A1Π state; intensities varied differently plasma parameters changed. Between 150 400 W power at 20 mTorr there no variation density, indicating that dissociation fraction BCl3 constant with power. No significant interactions between Cl2 or Ar evident measurements. However, suppressed by addition nitrogen plasma. radially uniform all mixtures, but axial measurements showed ...