Imprint lithography method, master template for imprint, wire grid polarizer manufactured using the master template and display substrate having the same
作者： Xie Lei , Jang Daehwan , Jo Gugrae , Park Seung-Won , Kim Taewoo
DOI:
关键词: Optoelectronics 、 Lithography 、 Nanotechnology 、 Substrate (printing) 、 Etching (microfabrication) 、 Resist 、 Wire grid 、 Polarizer 、 Materials science
摘要: An imprint lithography method includes forming a first pattern on substrate in area and third area, wherein the is spaced apart from resist second adjacent areas, areas by etching an element under using as etch barrier, barrier.
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