Imprint method and processing method of substrate using the imprint method

作者: Junichi Seki , Atsunori Terasaki , Shingo Okushima , Nao Nakatsuji , Haruhito Ono

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摘要: An imprint method for imprinting a pattern of mold onto resin material on substrate includes step forming first processed area in which an corresponding to the is formed and outside at periphery by bringing into contact with substrate; protection layer, protecting area, area; removing layer while protected so as not be removed.

参考文章(12)
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Nobuhito Suehira, Masao Majima, Junichi Seki, Processing apparatus, processing method, and process for producing chip ,(2006)
Ian McMackin, Edward Fletcher, Wesley Martin, Michael Miller, Van Truskett, Frank Xu, Nicholas Stacey, Christopher MacKay, Imprint lithography method to control extrusion of a liquid from a desired region on a substrate ,(2005)