Reverse tone patterning on surfaces having surface planarity perturbations
作者： Sidlgata Sreenivasan , Nicholas Stacey
DOI:
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摘要: The present invention features a method of patterning substrate that includes forming, on the substrate, first film having an original pattern plurality projections subset which extends from nadir surface terminating in apex defining height therebetween. A second is disposed upon and defines spaced-apart projections. variation distance between any one being within predetermined range. recorded transferred onto corresponds to pattern, range selected minimize distortions pattern.
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