Imprint method, imprint apparatus, and article manufacturing method
作者： Hiroshi Kurosawa
DOI:
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摘要: An imprint method includes an inspection step of inspecting a substrate to obtain information foreign substance on the substrate; and film forming covering substance, using substrate, wherein is performed before contact step.
lens.org 参考文章(9)
Junichi Seki, Atsunori Terasaki, Shingo Okushima, Nao Nakatsuji, Haruhito Ono, Imprint method and processing method of substrate using the imprint method ,(2008)
Hiroshi Miyakoshi, Imprinting apparatus and method ,(2006)
Yvonne Wendela Kruijt-Stegeman, Vadim Yevgenyevich Banine, Roelof Koole, Sander Frederik Wuister, Jeroen Herman Lammers, Johan Frederik Dijksman, Imprint lithography method and apparatus ,(2010)
Hiroshi Sato, Imprint apparatus and article manufacturing method ,(2011)
Niyaz Khusnatdinov, Ian Matthew McMackin, Douglas J. Resnick, Sidlgata V. Sreenivasan, Gerard M. Schmid, Ecron D. Thompson, Particle Mitigation for Imprint Lithography ,(2009)
Takaishi Kazuhiko, Fukushi Masanori, PATTERN TRANSFER APPARATUS AND PATTERN TRANSFER METHOD ,(2009)
Van Nguyen Truskett, Fluid Dispense System Coating ,(2009)
Ikuo Yoneda, Shinji Mikami, 哲郎 中杉, Tetsuo Nakasugi, 郁男 米田, 信二 三上, Nano-imprint method ,(2008)
Tsutsui Takuji, PATTERN FORMING METHOD ,(2009)