作者: Shihyun Ahn , F. Ren , Erin Patrick , Mark E. Law , S. J. Pearton
DOI: 10.1063/1.4972265
关键词: Thermal stability 、 Ion implantation 、 Annealing (metallurgy) 、 Thermal diffusivity 、 Solubility 、 Deuterium 、 Radiochemistry 、 Activation energy 、 Analytical chemistry 、 Chemistry 、 Atmospheric temperature range
摘要: Deuterium incorporation depths of ∼0.13–0.65 μm were obtained in bulk, single-crystal Ga 2 O 3 during exposure to 2 H plasmas for 0.5 h at 100–270 C. The data were fit using the …