Apparatus for providing uniform exposure at an exposing station

作者: John Douglas Anderson , Graham Stewart Brandon Street , Nigel John Robert Dashwood

DOI:

关键词: Electrical engineeringRadiant energyOpticsMaterials scienceLight guide

摘要: Apparatus for producing uniform exposure at an exposing station comprises a source (1; 63, 64) of radiant energy; means (8 to 10; 27 30; 31 37; 41; 67, 70, 71) redistributing said energy 'n manner within rotationally symmetric divergent cone (42) and/or over predetermined cross-sectional area (53) delivery station; and (2, 4 6, 15 18; 20, 21, 24, 25; 43 52; 59, 60; 69, 77 81) controlling the level delivered in use expos- ng (12 14; 56 58; 72, 75, 76). The is preferably pulse operated least one laser. optically transmitting fibre light guide.

参考文章(2)
Richard Albert Miller, George David Bucher, Pulsed laser machining apparatus ,(1983)
D. Kuntz, Specifying laser diode optics Laser focus with fiberoptic communications. ,vol. 20, pp. 44- 55 ,(1984)