Device for and method of providing marks on an object by means of electromagnetic radiation, and object provided with such marks
作者： Sipke Wadman , Gerrit Cornelis Verkade , Adrianus Richard Christofoor Engelfriet
DOI:
关键词: System a 、 Electromagnetic radiation 、 Radiation 、 Surface (mathematics) 、 Object (computer science) 、 Irradiation 、 Intensity (heat transfer) 、 Beam (structure) 、 Materials science 、 Optics
摘要: In a marking system pattern of marks present in mask (30) is transferred to the surface (51) an object (50) by causing radiation act on via (30). By adapting shape and cross-section beam be shown, irradiated at high intensity while amount falling outside reduced. This achieved means exchangeable optical guide and/or cylindrical lenses (21, 22) stepwise scanning one or two directions (23, 24) parts (I 1 ,..., In) overlap each other considerable extent.
lens.org 参考文章(3)
John Douglas Anderson, Graham Stewart Brandon Street, Nigel John Robert Dashwood, Apparatus for providing uniform exposure at an exposing station ,(1986)
Makoto Torigoe, Method and apparatus for scanning exposure ,(1988)