Split gate NAND flash memory structure and array, method of programming, erasing and reading thereof, and method of manufacturing

作者: Dana Lee , Yuniarto Widjaja , John W. Cooksey , Changyuan Chen , Feng Gao

DOI:

关键词: Reading (computer)Materials scienceCommunication channelSubstrate (electronics)OptoelectronicsNAND gateNand flash memoryElectrical engineering

摘要: A split gate NAND flash memory structure is formed on a semiconductor substrate of first conductivity type. The comprises region second type in the with substrate, spaced apart from region. continuous channel defined between and plurality floating gates are one another each positioned over separate portion control provided associated adjacent to gate. Each has two portions: capacitively coupled thereto.

参考文章(33)
Tomoko Ogura, Tomoya Saito, Seiki Ogura, Kimihiro Satoh, Twin NAND device structure, array operations and fabrication method ,(2003)
Masataka Kato, Shiro Akamatsu, Fukuo Owada, Masahito Takahashi, Akihiko Satoh, Semiconductor integrated circuit device and a method of manufacturing thereof ,(2001)
James A. Cunningham, Richard A. Blanchard, Method and apparatus for providing an embedded flash-EEPROM technology ,(2000)
Cheng-Yuan Hsu, Chi-Wei Hung, Da Sung, Chi-Shan Wu, S.C. Chen, H.H. Kuo, J.Y. Pan, C.L. Chen, I.C. Chuang, V. Huang, C.C. Hsue, D.-T. Fan, Jung-Chang Lu, C.Y.-S. Cho, K. Tseng, A. Hsu, B. Sheen, P. Tuntasood, Chiou-Feng Chen, Split-gate NAND flash memory at 120nm technology node featuring fast programming and erase symposium on vlsi technology. pp. 78- 79 ,(2004) , 10.1109/VLSIT.2004.1345403
Fujio C O Patent Division Masuoka, Programmable semiconductor memory ,(1988)
Eliyahou Harari, Jack H. Yuan, Daniel C. Guterman, George Samachisa, Dual floating gate EEPROM cell array with steering gates shared by adjacent cells ,(1999)