Epitaxial growth of Bi12GeO20 thin‐film optical waveguides using excimer laser ablation
作者： K. E. Youden , R. W. Eason , M. C. Gower , N. A. Vainos
DOI: 10.1063/1.106162
关键词: Sputtering 、 Excimer laser 、 Diffraction 、 Thin film 、 Materials science 、 Photorefractive effect 、 Optics 、 Refractive index 、 Germanium oxide 、 Bismuth
摘要: Thin‐film optical waveguides of the photorefractive material bismuth germanium oxide (Bi12GeO20) have been epitaxially grown onto heated zirconia substrates by excimer laser ablative sputtering. The epitaxial nature and stoichiometry films were verified using x‐ray diffraction analysis. Waveguide modes observed for effective refractive indices in close agreement with theoretical predictions.
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